Show simple item record

Measurement and simulation of boron diffusivity in strained Si1-XGex epitaxial layers

dc.contributor.authorKrishnasamy, Rajendran
dc.contributor.authorSchoenmaker, Wim
dc.date.accessioned2021-10-14T17:39:33Z
dc.date.available2021-10-14T17:39:33Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5597
dc.sourceIIOimport
dc.titleMeasurement and simulation of boron diffusivity in strained Si1-XGex epitaxial layers
dc.typeJournal article
dc.source.peerreviewno
dc.source.beginpage317
dc.source.endpage321
dc.source.journalVLSI Design
dc.source.issue1_4
dc.source.volume13
imec.availabilityPublished - imec
imec.internalnotes7th Int. Workshop on Computational Electronis (ICWE-7). May 2000; Glasgow


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record