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Characterisation of ALCVD ZrO2 thin films by TEM

dc.contributor.authorRichard, Olivier
dc.contributor.authorBender, Hugo
dc.contributor.authorHoussa, Michel
dc.contributor.authorZhao, Chao
dc.date.accessioned2021-10-14T17:41:46Z
dc.date.available2021-10-14T17:41:46Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5610
dc.sourceIIOimport
dc.titleCharacterisation of ALCVD ZrO2 thin films by TEM
dc.typeProceedings paper
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorHoussa, Michel
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.contributor.orcidimecHoussa, Michel::0000-0003-1844-3515
dc.source.peerreviewno
dc.source.beginpage407
dc.source.endpage410
dc.source.conferenceMicroscopy of Semiconducting Materials - MSMXII
dc.source.conferencedate25/03/2001
dc.source.conferencelocationOxford UK
imec.availabilityPublished - imec
imec.internalnotesIOP Conference Series; Vol. 169


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