Show simple item record

dc.contributor.authorClarysse, Trudo
dc.contributor.authorDe Wolf, Peter
dc.contributor.authorBender, Hugo
dc.contributor.authorVandervorst, Wilfried
dc.date.accessioned2021-09-29T13:04:36Z
dc.date.available2021-09-29T13:04:36Z
dc.date.issued1995
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/561
dc.sourceIIOimport
dc.titleRecent insights in the physical modeling of the spreading resistance point contact
dc.typeProceedings paper
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorVandervorst, Wilfried
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage29.1
dc.source.endpage29.2
dc.source.conference3rd Int. Workshop on the Measurement and Characterizaton of Ultra-Shallow Dopant Profiles in Semiconductors
dc.source.conferencedate20/03/1995
dc.source.conferencelocationResearch Triangle Park, NC USA
imec.availabilityPublished - open access


Files in this item

Thumbnail

This item appears in the following collection(s)

Show simple item record