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dc.contributor.authorSedky, Sherif
dc.contributor.authorWitvrouw, Ann
dc.contributor.authorCaymax, Matty
dc.contributor.authorRoussel, Philippe
dc.date.accessioned2021-10-14T17:47:36Z
dc.date.available2021-10-14T17:47:36Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5643
dc.sourceIIOimport
dc.titleEffect of deposition and annealing temperature on the structural and mechanical properties of poly SiGe
dc.typeProceedings paper
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorRoussel, Philippe
dc.contributor.orcidimecRoussel, Philippe::0000-0002-0402-8225
dc.source.peerreviewno
dc.source.beginpageA8.5.1
dc.source.endpage6
dc.source.conferenceAmorphous and Heterogeneous Silicon Thin Films - 2000; San Francisco, CA, USA; 24-28 April 2000.
dc.source.conferencelocation
imec.availabilityPublished - imec
imec.internalnotes


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