Show simple item record

Controllable change of porosity of 3-methylsilane low-k dielectric film

dc.contributor.authorShamiryan, Denis
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorVanhaelemeersch, Serge
dc.contributor.authorMaex, Karen
dc.date.accessioned2021-10-14T17:48:59Z
dc.date.available2021-10-14T17:48:59Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5651
dc.sourceIIOimport
dc.titleControllable change of porosity of 3-methylsilane low-k dielectric film
dc.typeJournal article
dc.contributor.imecauthorVanhaelemeersch, Serge
dc.contributor.imecauthorMaex, Karen
dc.contributor.orcidimecVanhaelemeersch, Serge::0000-0003-2102-7395
dc.source.peerreviewno
dc.source.beginpageF3
dc.source.endpageF5
dc.source.journalElectrochemical and Solid-State Letters
dc.source.issue1
dc.source.volume4
imec.availabilityPublished - imec


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record