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Gray bar masking: fabrication and imaging for 193 nm

dc.contributor.authorSmith, Bruce
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorMartin, P. W.
dc.contributor.authorRack, P.
dc.contributor.authorHsu, S.
dc.contributor.authorChen, F.
dc.date.accessioned2021-10-14T17:51:51Z
dc.date.available2021-10-14T17:51:51Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5667
dc.sourceIIOimport
dc.titleGray bar masking: fabrication and imaging for 193 nm
dc.typeOral presentation
dc.contributor.imecauthorVandenberghe, Geert
dc.source.peerreviewno
dc.source.conference21st Annual BACUS Symposium on Photomask Technology; October 2001; Monterey, CA, USA.
dc.source.conferencelocation
imec.availabilityPublished - imec


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