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Orientation-dependent stress build-up during the formation of epitaxial CoSi2

dc.contributor.authorSteegen, An
dc.contributor.authorDetavernier, C.
dc.contributor.authorLauwers, A.
dc.contributor.authorMaex, Karen
dc.contributor.authorVan Meirhaeghe, R. L.
dc.contributor.authorCardon, F.
dc.date.accessioned2021-10-14T17:52:44Z
dc.date.available2021-10-14T17:52:44Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5672
dc.sourceIIOimport
dc.titleOrientation-dependent stress build-up during the formation of epitaxial CoSi2
dc.typeJournal article
dc.contributor.imecauthorMaex, Karen
dc.source.peerreviewno
dc.source.beginpage145
dc.source.endpage150
dc.source.journalMicroelectronic Engineering
dc.source.issue1_4
dc.source.volume55
imec.availabilityPublished - imec


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