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Characterisation of the local stress in CoSi2 silicided shallow trench isolation structures

dc.contributor.authorStuer, Cindy
dc.contributor.authorSteegen, An
dc.contributor.authorBender, Hugo
dc.contributor.authorVan Landuyt, J.
dc.contributor.authorMaex, Karen
dc.date.accessioned2021-10-14T17:55:25Z
dc.date.available2021-10-14T17:55:25Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5687
dc.sourceIIOimport
dc.titleCharacterisation of the local stress in CoSi2 silicided shallow trench isolation structures
dc.typeProceedings paper
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorMaex, Karen
dc.source.peerreviewno
dc.source.beginpage481
dc.source.endpage484
dc.source.conferenceMicroscopy of Semiconducting Materials - MSMXII
dc.source.conferencedate25/03/2001
dc.source.conferencelocationOxford UK
imec.availabilityPublished - imec
imec.internalnotesIOP Conference Series; Vol. 169


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