Show simple item record

Plasma charging damage issues in copper single and dual damascene, oxide and low-k dielectric interconnects

dc.contributor.authorVan den bosch, G.
dc.contributor.authorDe Jaeger, Brice
dc.contributor.authorTokei, Zsolt
dc.contributor.authorGroeseneken, Guido
dc.date.accessioned2021-10-14T18:03:07Z
dc.date.available2021-10-14T18:03:07Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5728
dc.sourceIIOimport
dc.titlePlasma charging damage issues in copper single and dual damascene, oxide and low-k dielectric interconnects
dc.typeProceedings paper
dc.contributor.imecauthorDe Jaeger, Brice
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorGroeseneken, Guido
dc.contributor.orcidimecDe Jaeger, Brice::0000-0001-8804-7556
dc.source.peerreviewno
dc.source.beginpage8
dc.source.endpage11
dc.source.conference6th International Symposium on Plasma Process-Induced Damage; May 14-15, 2001. Monterey, CA, USA.
dc.source.conferencelocation
imec.availabilityPublished - imec


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record