Performance optimisation of the double exposure alternatin PSM for sub-100 nm ICs

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Authors
Vandenberghe, Geert; Driessen, Frank; Van Adrichem, Paul; Ronse, Kurt
Conference
21st Annual BACUS Symposium on Photomask Technology; October 2001; Monterey, CA, USA.
Title
Performance optimisation of the double exposure alternatin PSM for sub-100 nm ICs
Publication type
Oral presentation
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