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ArF lithography options for 100-nm technologies

dc.contributor.authorVandenberghe, Geert
dc.contributor.authorKim, Young-Chang
dc.contributor.authorDelvaux, Christie
dc.contributor.authorLucas, Kevin
dc.contributor.authorChoi, Sang-Jun
dc.contributor.authorErcken, Monique
dc.contributor.authorRonse, Kurt
dc.contributor.authorVleeming, Bert
dc.date.accessioned2021-10-14T18:10:20Z
dc.date.available2021-10-14T18:10:20Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5767
dc.sourceIIOimport
dc.titleArF lithography options for 100-nm technologies
dc.typeProceedings paper
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorDelvaux, Christie
dc.contributor.imecauthorErcken, Monique
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.source.peerreviewno
dc.source.beginpage179
dc.source.endpage190
dc.source.conferenceOptical Microlithography XIV
dc.source.conferencedate27/02/2001
dc.source.conferencelocationSanta Clara, CA USA
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 4346


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