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Analysis of trace metals in thin silicon nitride films by total-reflection X-ray fluorescence

dc.contributor.authorVereecke, Guy
dc.contributor.authorArnauts, Sophia
dc.contributor.authorVan Doorne, Patrick
dc.contributor.authorKenis, Karine
dc.contributor.authorOnsia, Bart
dc.contributor.authorVerstraeten, K.
dc.contributor.authorSchaekers, Marc
dc.contributor.authorVan Hoeymissen, Jan
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-14T18:17:51Z
dc.date.available2021-10-14T18:17:51Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5805
dc.sourceIIOimport
dc.titleAnalysis of trace metals in thin silicon nitride films by total-reflection X-ray fluorescence
dc.typeJournal article
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorArnauts, Sophia
dc.contributor.imecauthorKenis, Karine
dc.contributor.imecauthorOnsia, Bart
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.contributor.orcidimecSchaekers, Marc::0000-0002-1496-7816
dc.source.peerreviewno
dc.source.beginpage2321
dc.source.endpage2330
dc.source.journalSpectrochimica Acta B
dc.source.volume56
imec.availabilityPublished - imec


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