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Removal of submicrometer particles from silicon wafer surfaces using HF-based cleaning mixtures

dc.contributor.authorVos, Rita
dc.contributor.authorLux, Marcel
dc.contributor.authorXu, Kaidong
dc.contributor.authorFyen, Wim
dc.contributor.authorKenens, Conny
dc.contributor.authorConard, Thierry
dc.contributor.authorMertens, Paul
dc.contributor.authorHeyns, Marc
dc.contributor.authorHatcher, Z.
dc.contributor.authorHoffman, M.
dc.date.accessioned2021-10-14T18:21:29Z
dc.date.available2021-10-14T18:21:29Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5823
dc.sourceIIOimport
dc.titleRemoval of submicrometer particles from silicon wafer surfaces using HF-based cleaning mixtures
dc.typeJournal article
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorLux, Marcel
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.source.peerreviewno
dc.source.beginpageG683
dc.source.endpageG691
dc.source.journalJournal of the Electrochemical Society
dc.source.issue12
dc.source.volume148
imec.availabilityPublished - imec


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