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Generation of hole traps in silicon dioxides

dc.contributor.authorZhang, Jenny
dc.contributor.authorSii, H. K.
dc.contributor.authorGroeseneken, Guido
dc.contributor.authorDegraeve, Robin
dc.date.accessioned2021-10-14T18:30:38Z
dc.date.available2021-10-14T18:30:38Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5867
dc.sourceIIOimport
dc.titleGeneration of hole traps in silicon dioxides
dc.typeProceedings paper
dc.contributor.imecauthorGroeseneken, Guido
dc.contributor.imecauthorDegraeve, Robin
dc.source.peerreviewno
dc.source.beginpage50
dc.source.endpage54
dc.source.conferenceProceedings of the 8th International Symposium on the Physical and Failure Analysis of Integrated Circuits - IPFA
dc.source.conferencelocation
imec.availabilityPublished - imec


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