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Hole trapping and trap generation in the gate silicon dioxide

dc.contributor.authorZhang, Jenny
dc.contributor.authorSii, H. K.
dc.contributor.authorGroeseneken, Guido
dc.contributor.authorDegraeve, Robin
dc.date.accessioned2021-10-14T18:30:50Z
dc.date.available2021-10-14T18:30:50Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5868
dc.sourceIIOimport
dc.titleHole trapping and trap generation in the gate silicon dioxide
dc.typeJournal article
dc.contributor.imecauthorGroeseneken, Guido
dc.contributor.imecauthorDegraeve, Robin
dc.source.peerreviewno
dc.source.beginpage1127
dc.source.endpage1135
dc.source.journalIEEE Trans. Electron Devices
dc.source.issue6
dc.source.volume48
imec.availabilityPublished - imec


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