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Ultrashallow junctions for advanced CMOS technology

dc.contributor.authorStolk, Peter
dc.contributor.authorMeyssen, Veerle
dc.contributor.authorLindsay, Richard
dc.contributor.authorDachs, Charles
dc.contributor.authorMannino, Giovanni
dc.contributor.authorCowern, Nick
dc.date.accessioned2021-10-14T18:41:00Z
dc.date.available2021-10-14T18:41:00Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5917
dc.sourceIIOimport
dc.titleUltrashallow junctions for advanced CMOS technology
dc.typeProceedings paper
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conferenceProceedings SEMI Front End Technology Conference
dc.source.conferencedate24/04/2001
dc.source.conferencelocationMünchen Germany
imec.availabilityPublished - imec


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