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Single wafer drying

dc.contributor.authorHolsteyns, Frank
dc.contributor.authorFyen, Wim
dc.contributor.authorLauerhaas, Jeff
dc.contributor.authorArnauts, Sophia
dc.contributor.authorMertens, Paul
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-14T18:41:38Z
dc.date.available2021-10-14T18:41:38Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5920
dc.sourceIIOimport
dc.titleSingle wafer drying
dc.typeProceedings paper
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.imecauthorArnauts, Sophia
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHeyns, Marc
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conferenceWafer Cleaning and Surface Preparation Workshop
dc.source.conferencedate15/05/2001
dc.source.conferencelocationAustin, TX USA
imec.availabilityPublished - open access
imec.internalnotesInternational Sematech


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