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Controllable change of porosity of SiOCH low-k dielectric film

dc.contributor.authorShamiryan, Denis
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorVanhaelemeersch, Serge
dc.contributor.authorMaex, Karen
dc.date.accessioned2021-10-14T18:42:30Z
dc.date.available2021-10-14T18:42:30Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5924
dc.sourceIIOimport
dc.titleControllable change of porosity of SiOCH low-k dielectric film
dc.typeProceedings paper
dc.contributor.imecauthorVanhaelemeersch, Serge
dc.contributor.imecauthorMaex, Karen
dc.contributor.orcidimecVanhaelemeersch, Serge::0000-0003-2102-7395
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage635
dc.source.endpage640
dc.source.conferenceAdvanced Metallization Conference 2000
dc.source.conferencedate2/10/2000
dc.source.conferencelocationSan Diego, CA USA
imec.availabilityPublished - open access
imec.internalnotesConference Proceedings ULSI XVI


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