dc.contributor.author | Ruede, David | |
dc.contributor.author | Ercken, Monique | |
dc.contributor.author | Borgers, Tom | |
dc.date.accessioned | 2021-10-14T18:42:42Z | |
dc.date.available | 2021-10-14T18:42:42Z | |
dc.date.issued | 2001 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/5925 | |
dc.source | IIOimport | |
dc.title | Molecular base sensitivity studies of various DUV resists used in semiconductor fabrication | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Ercken, Monique | |
dc.contributor.imecauthor | Borgers, Tom | |
dc.contributor.orcidimec | Borgers, Tom::0000-0002-7878-6977 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 1020 | |
dc.source.conference | Optical Microlithography XIV | |
dc.source.conferencedate | 27/02/2001 | |
dc.source.conferencelocation | Santa Clara, CA USA | |
imec.availability | Published - open access | |
imec.internalnotes | Proceedings of SPIE; Vol. 4346 | |