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Molecular base sensitivity studies of various DUV resists used in semiconductor fabrication

dc.contributor.authorRuede, David
dc.contributor.authorErcken, Monique
dc.contributor.authorBorgers, Tom
dc.date.accessioned2021-10-14T18:42:42Z
dc.date.available2021-10-14T18:42:42Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5925
dc.sourceIIOimport
dc.titleMolecular base sensitivity studies of various DUV resists used in semiconductor fabrication
dc.typeProceedings paper
dc.contributor.imecauthorErcken, Monique
dc.contributor.imecauthorBorgers, Tom
dc.contributor.orcidimecBorgers, Tom::0000-0002-7878-6977
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage1020
dc.source.conferenceOptical Microlithography XIV
dc.source.conferencedate27/02/2001
dc.source.conferencelocationSanta Clara, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 4346


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