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Analysis of silicide / diffusion contact resistance making use of transmission line stuctures

dc.contributor.authorAkheyar, Amal
dc.contributor.authorLauwers, Anne
dc.contributor.authorLindsay, Richard
dc.contributor.authorde Potter de ten Broeck, Muriel
dc.contributor.authorTempel, Georg
dc.contributor.authorMaex, Karen
dc.date.accessioned2021-10-14T21:06:58Z
dc.date.available2021-10-14T21:06:58Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5939
dc.sourceIIOimport
dc.titleAnalysis of silicide / diffusion contact resistance making use of transmission line stuctures
dc.typeProceedings paper
dc.contributor.imecauthorLauwers, Anne
dc.contributor.imecauthorde Potter de ten Broeck, Muriel
dc.contributor.imecauthorMaex, Karen
dc.source.peerreviewno
dc.source.beginpage53
dc.source.endpage58
dc.source.conferenceSilicon Materials - Processing, Characterization, and Reliability
dc.source.conferencedate1/04/2002
dc.source.conferencelocationSan Francisco, CA USA
imec.availabilityPublished - imec
imec.internalnotesMRS Symposium Proceedings; Vol. 716


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