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Non-destructive characterisation of porous low-k dielectric films

dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorMoguilnikov, Konstantin
dc.date.accessioned2021-10-14T21:07:55Z
dc.date.available2021-10-14T21:07:55Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5986
dc.sourceIIOimport
dc.titleNon-destructive characterisation of porous low-k dielectric films
dc.typeJournal article
dc.source.peerreviewno
dc.source.beginpage335
dc.source.endpage349
dc.source.journalMicroelectronic Engineering
dc.source.issue1_4
dc.source.volume64
imec.availabilityPublished - imec
imec.internalnotesMAM2002; Vaals, The Netherlands, 3-6 March 2002


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