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Stress variation across arrays of lines and its influence on LOCOS oxidation

dc.contributor.authorDe Wolf, Ingrid
dc.contributor.authorRooyackers, Rita
dc.contributor.authorMaes, Herman
dc.date.accessioned2021-09-29T13:05:14Z
dc.date.available2021-09-29T13:05:14Z
dc.date.issued1995
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/599
dc.sourceIIOimport
dc.titleStress variation across arrays of lines and its influence on LOCOS oxidation
dc.typeJournal article
dc.contributor.imecauthorDe Wolf, Ingrid
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage79
dc.source.endpage82
dc.source.journalMicroelectronic Engineering
dc.source.issue1_4
dc.source.volume28
imec.availabilityPublished - open access
imec.internalnotesProceedings of the 9th Biennial Conference on Insulating Films on Semiconductors, June 7-10, 1995, Villard-de-Lans, France.


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