Browsing Presentations by imec author "3193b486ff6d3430286eaadc93ff7205e2ec89d1"
Now showing items 1-9 of 9
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EUV Lithography in pre-production mode
Hendrickx, Eric; Hermans, Jan; Jonckheere, Rik; Van Den Heuvel, Dieter; Lorusso, Gian; Foubert, Philippe; De Bisschop, Peter; Vandenberghe, Geert; Ronse, Kurt (2012) -
IMEC lithography activities for 45nm node and beyond: mask impact
Philipsen, Vicky; De Bisschop, Peter; Hendrickx, Eric; Wiaux, Vincent; Vandenberghe, Geert; Jonckheere, Rik (2007) -
Multiple patterning: a path towards sub-20nm hp
Vandenberghe, Geert; Wong, Patrick; Vandenbroeck, Nadia; Bekaert, Joost; Laenens, Bart; De Bisschop, Peter; Versluijs, Janko; Wiaux, Vincent (2010) -
SRAM cell architecture in 20nm and beyond: bulk planar versus bulk finFET
Dobrovolny, Petr; De Bisschop, Peter; Miranda Corbalan, Miguel; Zuber, Paul; Cosemans, Stefan; Mallik, Arindam; Van de Kerkhove, Jeroen (2012) -
Status and critical challenges for 157nm lithography
Ronse, Kurt; Goethals, Mieke; Jonckheere, Rik; De Bisschop, Peter; Okoroanyanwu, Uzo (2003) -
Status of 157nm Lithography Development
Jonckheere, Rik; Hermans, Jan; Goethals, Mieke; De Bisschop, Peter; Eliat, Astrid; Van Den Heuvel, Dieter; Van Roey, Frieda; Beckx, Stephan; Wouters, Johan M. D.; de Marneffe, Jean-Francois; Ronse, Kurt (2003) -
Symbolic SRAM layout analysis for design and technology exploration
Zuber, Paul; Miranda Corbalan, Miguel; Dobrovolny, Petr; De Bisschop, Peter; Badaroglu, Mustafa; Verkest, Diederik (2012) -
Test of vector effect emulation of the AIMSTM45-193i
De Bisschop, Peter; Philipsen, Vicky; Birkner, Robert; Richter, Rigo; Scheruebl, Thomas (2007) -
The impact of backside particles on the limits of optical lithography
Bearda, Twan; Mertens, Paul; Holsteyns, Frank; De Bisschop, Peter; Compen, R.; van Meer, R.; Heyns, Marc (2004)