Browsing Presentations by imec author "facb13b168ae2da3bc13f9255970d41c7d45341d"
Now showing items 1-5 of 5
-
ALD strontium titanates and their characterization
Popovici, Mihaela Ioana; Van Elshocht, Sven; Tomida, Kazuyuki; Menou, Nicolas; Swerts, Johan; Pawlak, Malgorzata; Kaczer, Ben; Kim, Min-Soo; Brijs, Bert; Favia, Paola; Conard, Thierry; Franquet, Alexis; Moussa, Alain; Debusschere, Ingrid; Altimime, Laith; Kittl, Jorge (2010) -
Alternative high-k dielectrics for semiconductor applications
Van Elshocht, Sven; Adelmann, Christoph; Clima, Sergiu; Pourtois, Geoffrey; Conard, Thierry; Delabie, Annelies; Franquet, Alexis; Lehnen, Peer; Meersschaut, Johan; Menou, Nicolas; Popovici, Mihaela Ioana; Richard, Olivier; Schram, Tom; Wang, Xin Peng; Hardy, An; Dewulf, Daan; van Bael, M.K.; Blomberg, T.; Pieereux, D.; Swerts, J.; Maes, J.W.; Wouters, Dirk; De Gendt, Stefan; Kittl, Jorge (2008) -
Atomic layer deposition of Ru thin films using the zero-valence precursor EBECH Ru
Adelmann, Christoph; Popovici, Mihaela Ioana; Groven, Benjamin; Moens, Kristof; Meersschaut, Johan; Franquet, Alexis; Swerts, Johan; Delabie, Annelies; Van Elshocht, Sven (2014) -
Non-linear dielectric constant increase with Ti composition in high-k ALD-HfTiOx films after O2 crystallization annealing
Tomida, Kazuyuki; Popovici, Mihaela Ioana; Opsomer, Karl; Menou, Nicolas; Delabie, Annelies; Swerts, Johan; Steenbergen, Johnny; Kaczer, Ben; Van Elshocht, Sven; Detavernier, Christophe; Wouters, Dirk; Kittl, Jorge (2009) -
Ru/STO/Ru DRAM MIM capacitors by atomic layer deposition
Popovici, Mihaela Ioana (2015)