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Deep UV lithography for mass-manufacturing photonic crystal-based components

dc.contributor.authorBogaerts, Wim
dc.contributor.authorTaillaert, Dirk
dc.contributor.authorBaets, Roel
dc.contributor.authorWiaux, Vincent
dc.contributor.authorBeckx, Stephan
dc.date.accessioned2021-10-14T21:10:19Z
dc.date.available2021-10-14T21:10:19Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6042
dc.sourceIIOimport
dc.titleDeep UV lithography for mass-manufacturing photonic crystal-based components
dc.typeProceedings paper
dc.contributor.imecauthorBogaerts, Wim
dc.contributor.imecauthorBaets, Roel
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.imecauthorBeckx, Stephan
dc.contributor.orcidimecBogaerts, Wim::0000-0003-1112-8950
dc.contributor.orcidimecBaets, Roel::0000-0003-1266-1319
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpageIII-24
dc.source.conferenceWorkshop and EOS Topical Meeting on Two-Dimensional Photonic Crystals
dc.source.conferencedate25/08/2002
dc.source.conferencelocationAscona Switzerland
imec.availabilityPublished - open access


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