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dc.contributor.authorCarbonell, Laure
dc.contributor.authorRatchev, Petar
dc.contributor.authorCaluwaerts, Rudy
dc.contributor.authorVan Hove, Marleen
dc.contributor.authorVerlinden, B.
dc.contributor.authorMaex, Karen
dc.date.accessioned2021-10-14T21:12:22Z
dc.date.available2021-10-14T21:12:22Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6080
dc.sourceIIOimport
dc.titleDry oxidation mechanisms of copper in trenches
dc.typeJournal article
dc.contributor.imecauthorCaluwaerts, Rudy
dc.contributor.imecauthorMaex, Karen
dc.source.peerreviewno
dc.source.beginpage63
dc.source.endpage71
dc.source.journalMicroelectronic Engineering
dc.source.issue1_4
dc.source.volume64
imec.availabilityPublished - imec
imec.internalnotesMAM2002; Vaals, The Netherlands, 3-6 March 2002


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