dc.contributor.author | Claes, Martine | |
dc.contributor.author | Röhr, Erika | |
dc.contributor.author | De Gendt, Stefan | |
dc.contributor.author | Lagrange, Sébastien | |
dc.contributor.author | Bergman, E. | |
dc.contributor.author | Heyns, Marc | |
dc.date.accessioned | 2021-10-14T21:14:42Z | |
dc.date.available | 2021-10-14T21:14:42Z | |
dc.date.issued | 2002 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/6113 | |
dc.source | IIOimport | |
dc.title | Ozonated HF applications in a spray processing tool | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Claes, Martine | |
dc.contributor.imecauthor | De Gendt, Stefan | |
dc.contributor.imecauthor | Heyns, Marc | |
dc.contributor.orcidimec | De Gendt, Stefan::0000-0003-3775-3578 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 314 | |
dc.source.endpage | 321 | |
dc.source.conference | Cleaning Technology in Semiconductor Device Manufacturing VII | |
dc.source.conferencedate | 4/09/2001 | |
dc.source.conferencelocation | San Francisco, CA USA | |
imec.availability | Published - open access | |
imec.internalnotes | Electrochemical Society Proceedings; Vol. 2001-26 | |