dc.contributor.author | Croon, Jeroen | |
dc.contributor.author | Storms, Greet | |
dc.contributor.author | Winkelmeier, Stephanie | |
dc.contributor.author | Pollentier, Ivan | |
dc.contributor.author | Ercken, Monique | |
dc.contributor.author | Decoutere, Stefaan | |
dc.contributor.author | Sansen, Willy | |
dc.contributor.author | Maes, Herman | |
dc.date.accessioned | 2021-10-14T21:18:22Z | |
dc.date.available | 2021-10-14T21:18:22Z | |
dc.date.issued | 2002 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/6157 | |
dc.source | IIOimport | |
dc.title | Line edge roughness: characterization, modeling and impact on device behavior | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Pollentier, Ivan | |
dc.contributor.imecauthor | Ercken, Monique | |
dc.contributor.imecauthor | Decoutere, Stefaan | |
dc.contributor.orcidimec | Pollentier, Ivan::0000-0002-4266-6500 | |
dc.contributor.orcidimec | Decoutere, Stefaan::0000-0001-6632-6239 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 307 | |
dc.source.endpage | 310 | |
dc.source.conference | IEDM Technical Digest | |
dc.source.conferencedate | 9/12/2002 | |
dc.source.conferencelocation | San Francisco, CA USA | |
imec.availability | Published - open access | |