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Oxide phase determination in silicon using infrared spectroscopy and transmission electron microscopy techniques

dc.contributor.authorDe Gryse, O.
dc.contributor.authorClauws, P.
dc.contributor.authorVan Landuyt, J.
dc.contributor.authorLebedev, O.
dc.contributor.authorClaeys, Cor
dc.contributor.authorSimoen, Eddy
dc.contributor.authorVanhellemont, Jan
dc.date.accessioned2021-10-14T21:21:24Z
dc.date.available2021-10-14T21:21:24Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6187
dc.sourceIIOimport
dc.titleOxide phase determination in silicon using infrared spectroscopy and transmission electron microscopy techniques
dc.typeJournal article
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.source.peerreviewno
dc.source.beginpage2493
dc.source.endpage2498
dc.source.journalJournal of Applied Physics
dc.source.issue4
dc.source.volume91
imec.availabilityPublished - imec


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