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Soft breakdown of ultra-thin gate oxide layers

dc.contributor.authorDepas, Michel
dc.contributor.authorHeyns, Marc
dc.contributor.authorMertens, Paul
dc.date.accessioned2021-09-29T13:05:40Z
dc.date.available2021-09-29T13:05:40Z
dc.date.issued1995
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/620
dc.sourceIIOimport
dc.titleSoft breakdown of ultra-thin gate oxide layers
dc.typeProceedings paper
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorMertens, Paul
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage235
dc.source.endpage238
dc.source.conference25th European Solid State Device Research Conference - ESSDERC
dc.source.conferencedate25/09/1995
dc.source.conferencelocationDen Haag The Netherlands
imec.availabilityPublished - open access


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