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dc.contributor.authorDe Smedt, Frank
dc.contributor.authorVankerckhoven, Hans
dc.contributor.authorVinckier, Chris
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorClaes, Martine
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-14T21:24:13Z
dc.date.available2021-10-14T21:24:13Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6215
dc.sourceIIOimport
dc.titleThe removal of organic contamination by O3/DI water processes: a theoretical study
dc.typeProceedings paper
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorClaes, Martine
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage54
dc.source.endpage60
dc.source.conferenceCleaning Technology in Semiconductor Device Manufacturing VII
dc.source.conferencedate4/09/2001
dc.source.conferencelocationSan Francisco, CA USA
imec.availabilityPublished - open access
imec.internalnotesElectrochemical Society Proceedings; Vol. 2001-26


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