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dc.contributor.authorDepas, Michel
dc.contributor.authorVermeire, Bert
dc.contributor.authorMertens, Paul
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-09-29T13:05:43Z
dc.date.available2021-09-29T13:05:43Z
dc.date.issued1995
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/622
dc.sourceIIOimport
dc.titleGrowth kinetics and electrical characteristics of ultra-thin pyrogenetic silicon oxide
dc.typeJournal article
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHeyns, Marc
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage125
dc.source.endpage128
dc.source.journalMicroelectronic Engineering
dc.source.issue1_4
dc.source.volume28
imec.availabilityPublished - open access
imec.internalnotesProceedings of the 9th Biennial Conference on Insulating Films on Semiconductors, June 7-10, 1995, Villard-de-Lans, France


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