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Characterization of a projection lens using the extended Nijboer-Zernike approach

dc.contributor.authorDirksen, Peter
dc.contributor.authorBraat, Joseph
dc.contributor.authorDe Bisschop, Peter
dc.contributor.authorJanssen, Augustus J.E.M.
dc.contributor.authorJuffermans, Casper
dc.contributor.authorWilliams, Alvina
dc.date.accessioned2021-10-14T21:32:34Z
dc.date.available2021-10-14T21:32:34Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6286
dc.sourceIIOimport
dc.titleCharacterization of a projection lens using the extended Nijboer-Zernike approach
dc.typeProceedings paper
dc.contributor.imecauthorDe Bisschop, Peter
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage1392
dc.source.endpage1399
dc.source.conferenceOptical Microlithography XV
dc.source.conferencedate5/03/2002
dc.source.conferencelocationSanta Clara, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 4691


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