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In-line electrical characterization of furnace and plasma and plasma nitrided gate dielectric films

dc.contributor.authorEason, K.
dc.contributor.authorPassefort, Sophie
dc.contributor.authorZhang, X.
dc.contributor.authorCubaynes, Florence
dc.contributor.authorSchaekers, Marc
dc.date.accessioned2021-10-14T21:34:19Z
dc.date.available2021-10-14T21:34:19Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6299
dc.sourceIIOimport
dc.titleIn-line electrical characterization of furnace and plasma and plasma nitrided gate dielectric films
dc.typeOral presentation
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.orcidimecSchaekers, Marc::0000-0002-1496-7816
dc.source.peerreviewno
dc.source.conference5th Technical and Scientific Meeting of CREMSI: New Tools and Processes for Thin Active Layers in the Advanced FEOL Techniques
dc.source.conferencedate14/11/2002
dc.source.conferencelocationFuveau France
imec.availabilityPublished - imec


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