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Progress towards a physical contact model for scanning spreading resistance microscopy

dc.contributor.authorEyben, Pierre
dc.contributor.authorDenis, Samuel
dc.contributor.authorClarysse, Trudo
dc.contributor.authorVandervorst, Wilfried
dc.date.accessioned2021-10-14T21:36:30Z
dc.date.available2021-10-14T21:36:30Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6316
dc.sourceIIOimport
dc.titleProgress towards a physical contact model for scanning spreading resistance microscopy
dc.typeOral presentation
dc.contributor.imecauthorEyben, Pierre
dc.contributor.imecauthorVandervorst, Wilfried
dc.source.peerreviewno
dc.source.conferenceE-MRS Spring Meeting Symposium E: Advanced Characterisation of Semiconductor Materials and Devices
dc.source.conferencedate18/06/2002
dc.source.conferencelocationStrasbourg France
imec.availabilityPublished - imec


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