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Pulsed force-scanning spreading resistance microscopy (PF-SSRM) for high spatial resolution 2D-dopant profiling

dc.contributor.authorEyben, Pierre
dc.contributor.authorFouchier, Marc
dc.contributor.authorAlbart, P.
dc.contributor.authorCharon-Verstappen, J.
dc.contributor.authorVandervorst, Wilfried
dc.date.accessioned2021-10-14T21:36:38Z
dc.date.available2021-10-14T21:36:38Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6317
dc.sourceIIOimport
dc.titlePulsed force-scanning spreading resistance microscopy (PF-SSRM) for high spatial resolution 2D-dopant profiling
dc.typeProceedings paper
dc.contributor.imecauthorEyben, Pierre
dc.contributor.imecauthorVandervorst, Wilfried
dc.source.peerreviewno
dc.source.beginpage297
dc.source.conferenceSilicon Front-End Junction Formation Technologies
dc.source.conferencedate1/04/2002
dc.source.conferencelocationSan Francisco, CA USA
imec.availabilityPublished - imec
imec.internalnotesMRS Symposium Proceedings; Vol. 717


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