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dc.contributor.authorAlves Donaton, Ricardo
dc.contributor.authorKolodinski, Sabine
dc.contributor.authorCaymax, Matty
dc.contributor.authorRoussel, Philippe
dc.contributor.authorBender, Hugo
dc.contributor.authorBrijs, Bert
dc.contributor.authorMaex, Karen
dc.date.accessioned2021-09-29T13:05:58Z
dc.date.available2021-09-29T13:05:58Z
dc.date.issued1995
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/632
dc.sourceIIOimport
dc.titleFormation of CoSi2 on strained Si0.8Ge0.2 using a sacrificial Si layer
dc.typeJournal article
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorRoussel, Philippe
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorMaex, Karen
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage77
dc.source.endpage81
dc.source.journalApplied Surface Science
dc.source.volume91
imec.availabilityPublished - open access
imec.internalnotesProceedings of the 1st European Workshop on Materials for Advanced Metallization. Radebeul, Germany, March 19-22, 1995.


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