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Etching of CoSi2 in HF-based solutions

dc.contributor.authorAlves Donaton, Ricardo
dc.contributor.authorLokere, K.
dc.contributor.authorVerbeeck, Rita
dc.contributor.authorMaex, Karen
dc.date.accessioned2021-09-29T13:05:59Z
dc.date.available2021-09-29T13:05:59Z
dc.date.issued1995
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/633
dc.sourceIIOimport
dc.titleEtching of CoSi2 in HF-based solutions
dc.typeJournal article
dc.contributor.imecauthorVerbeeck, Rita
dc.contributor.imecauthorMaex, Karen
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage221
dc.source.endpage7
dc.source.journalAppied Surface Science
dc.source.issue3
dc.source.volume89
imec.availabilityPublished - open access


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