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UV2Litho: usable vacuum ultra violet lithography

dc.contributor.authorGoethals, Mieke
dc.contributor.authorJonckheere, Rik
dc.contributor.authorVan Roey, F.
dc.contributor.authorHermans, J.
dc.contributor.authorEliat, Astrid
dc.contributor.authorRonse, Kurt
dc.contributor.authorWong, P.
dc.contributor.authorZandbergen, P.
dc.contributor.authorVasconi, M.
dc.contributor.authorSevergnini, E.
dc.contributor.authorHenke, W.
dc.contributor.authorHohle, C.
dc.contributor.authorHenry, D.
dc.contributor.authorThony, P.
dc.contributor.authorMarkey, L.
dc.contributor.authorSchiavone, P.
dc.contributor.authorFuard, D.
dc.date.accessioned2021-10-14T21:43:03Z
dc.date.available2021-10-14T21:43:03Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6362
dc.sourceIIOimport
dc.titleUV2Litho: usable vacuum ultra violet lithography
dc.typeOral presentation
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.source.peerreviewno
dc.source.conference3th International Symposium on 157nm Lithography
dc.source.conferencedate3/09/2002
dc.source.conferencelocationAntwerpen Belgium
imec.availabilityPublished - imec


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