dc.contributor.author | Hendrickx, Eric | |
dc.contributor.author | Vandenberghe, Geert | |
dc.contributor.author | Ronse, Kurt | |
dc.contributor.author | Colina, Alberto | |
dc.contributor.author | van der Hoff, Alex | |
dc.contributor.author | Dusa, Mircea | |
dc.contributor.author | Finders, Jo | |
dc.date.accessioned | 2021-10-14T21:45:38Z | |
dc.date.available | 2021-10-14T21:45:38Z | |
dc.date.issued | 2002 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/6379 | |
dc.source | IIOimport | |
dc.title | Pattern displacement induced by lens aberrations | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Hendrickx, Eric | |
dc.contributor.imecauthor | Vandenberghe, Geert | |
dc.contributor.imecauthor | Ronse, Kurt | |
dc.contributor.imecauthor | Dusa, Mircea | |
dc.contributor.orcidimec | Ronse, Kurt::0000-0003-0803-4267 | |
dc.source.peerreview | no | |
dc.source.beginpage | 1155 | |
dc.source.endpage | 1162 | |
dc.source.conference | 22nd Annual Bacus Symposium on Photomask Technology | |
dc.source.conferencedate | 1/10/2002 | |
dc.source.conferencelocation | Monterey, CA USA | |
imec.availability | Published - imec | |
imec.internalnotes | Proceedings of SPIE; Vol. 4889 | |