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Pattern displacement induced by lens aberrations

dc.contributor.authorHendrickx, Eric
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorRonse, Kurt
dc.contributor.authorColina, Alberto
dc.contributor.authorvan der Hoff, Alex
dc.contributor.authorDusa, Mircea
dc.contributor.authorFinders, Jo
dc.date.accessioned2021-10-14T21:45:38Z
dc.date.available2021-10-14T21:45:38Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6379
dc.sourceIIOimport
dc.titlePattern displacement induced by lens aberrations
dc.typeProceedings paper
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorDusa, Mircea
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.source.peerreviewno
dc.source.beginpage1155
dc.source.endpage1162
dc.source.conference22nd Annual Bacus Symposium on Photomask Technology
dc.source.conferencedate1/10/2002
dc.source.conferencelocationMonterey, CA USA
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 4889


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