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Interim investigation of CD-SEM resist shrinkage in 193nm lithography

dc.contributor.authorHoffmann, Thomas
dc.contributor.authorStorms, Greet
dc.contributor.authorVandenbroeck, Nadia
dc.contributor.authorDelvaux, Christie
dc.contributor.authorErcken, Monique
dc.contributor.authorPollentier, Ivan
dc.contributor.authorRonse, Kurt
dc.contributor.authorTakuji, Tada
dc.contributor.authorFelten, Frank
dc.contributor.authorWong, Evelyn
dc.date.accessioned2021-10-14T21:48:58Z
dc.date.available2021-10-14T21:48:58Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6400
dc.sourceIIOimport
dc.titleInterim investigation of CD-SEM resist shrinkage in 193nm lithography
dc.typeOral presentation
dc.contributor.imecauthorVandenbroeck, Nadia
dc.contributor.imecauthorDelvaux, Christie
dc.contributor.imecauthorErcken, Monique
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.source.peerreviewno
dc.source.conference3rd European Advanced Equipment Control / Advanced Process Control Conference
dc.source.conferencedate12/04/2002
dc.source.conferencelocationDresden Germany
imec.availabilityPublished - imec


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