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Reliable sub-nanometer repeatability for CD metrology in a reticle production environment

dc.contributor.authorHourd, Andrew
dc.contributor.authorGrimshaw, Anthony
dc.contributor.authorScheuring, Gerd
dc.contributor.authorGittinger, Christian
dc.contributor.authorDöbereiner, Stefan
dc.contributor.authorHillmann, Frank
dc.contributor.authorBrück, Hans-Jürgen
dc.contributor.authorChen, Shiuh-Bin
dc.contributor.authorChen, Parkson
dc.contributor.authorJonckheere, Rik
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorHartmann, Hans
dc.contributor.authorOrdynskyy, Vladimir
dc.contributor.authorPeter, Kai
dc.contributor.authorSchätz, Thomas
dc.contributor.authorSommer, Karl
dc.date.accessioned2021-10-14T21:50:21Z
dc.date.available2021-10-14T21:50:21Z
dc.date.issued2002-12
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6408
dc.sourceIIOimport
dc.titleReliable sub-nanometer repeatability for CD metrology in a reticle production environment
dc.typeProceedings paper
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.source.peerreviewno
dc.source.beginpage319
dc.source.endpage342
dc.source.conference22nd Annual BACUS Symposium on Photomask Technology
dc.source.conferencedate3/10/2002
dc.source.conferencelocationMonterey, CA USA
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 4889


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