Show simple item record

Tuning and simulating a 193nm resist for 2D applications

dc.contributor.authorHoward, W.
dc.contributor.authorWiaux, Vincent
dc.contributor.authorErcken, Monique
dc.contributor.authorBui, B.
dc.contributor.authorByers, J.D.
dc.contributor.authorPochkowski, M.
dc.date.accessioned2021-10-14T21:50:59Z
dc.date.available2021-10-14T21:50:59Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6412
dc.sourceIIOimport
dc.titleTuning and simulating a 193nm resist for 2D applications
dc.typeProceedings paper
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.imecauthorErcken, Monique
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage1190
dc.source.endpage1198
dc.source.conferenceOptical Microlithography XV
dc.source.conferencedate5/03/2002
dc.source.conferencelocationSanta Clara, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 4691


Files in this item

Thumbnail
Name:
6635.pdf
Size:
1.242Mb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record