Doping of oxidized float zone silicon by thermal donors- a low thermal budget doping method for device applications?

Publication:

2002

Proceedings Paper

Author(s)

Job, R.

;

Ulyashin, A.G.

;

Huang, Y.L.

;

Fahrner, W.R.

;

;

Claeys, Cor

;

Niedernostheide, F.-J.

;

Schulze, H.-J.

;

Tonelli, G.

2070 since deposited on 2021-10-14

Acq. date: 2026-09-21