Show simple item record

2001 Update on the SEMI standards mask qualification terminology task force

dc.contributor.authorJonckheere, Rik
dc.date.accessioned2021-10-14T21:57:19Z
dc.date.available2021-10-14T21:57:19Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6451
dc.sourceIIOimport
dc.title2001 Update on the SEMI standards mask qualification terminology task force
dc.typeProceedings paper
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.source.peerreviewno
dc.source.beginpage264
dc.source.endpage271
dc.source.conference21st Annual BACUS Symposium on Photomask Technology
dc.source.conferencedate3/10/2001
dc.source.conferencelocationMonterey, CA USA
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 4562


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record