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AttPSM CD control: mask bias and flare effects

dc.contributor.authorKim, Young-Chang
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorRonse, Kurt
dc.date.accessioned2021-10-14T22:02:05Z
dc.date.available2021-10-14T22:02:05Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6479
dc.sourceIIOimport
dc.titleAttPSM CD control: mask bias and flare effects
dc.typeProceedings paper
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage1041
dc.source.endpage1053
dc.source.conferenceOptical Microlithography XV
dc.source.conferencedate5/03/2002
dc.source.conferencelocationSanta Clara, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 4691


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