Investigation of poly-Si/HfO2 gate stacks in a self-aligned 65 nm NMOS process flow

Thumbnail
Metadata
Show full item record
Authors
Kubicek, Stefan; Carter, Richard; Cartier, Eduard; Lujan, Guilherme; Kerber, Andreas; Kaushik, Vidya; Chen, P.J.; De Gendt, Stefan; Heyns, Marc
Conference
33rd IEEE Semiconductor Interface Specialists Conference - SISC
Title
Investigation of poly-Si/HfO2 gate stacks in a self-aligned 65 nm NMOS process flow
Publication type
Oral presentation
Collections