Show simple item record

Defect-free Si thinning by in-situ HCI vapour etching

dc.contributor.authorLoo, Roger
dc.contributor.authorCaymax, Matty
dc.date.accessioned2021-10-14T22:14:12Z
dc.date.available2021-10-14T22:14:12Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6549
dc.sourceIIOimport
dc.titleDefect-free Si thinning by in-situ HCI vapour etching
dc.typeOral presentation
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorCaymax, Matty
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.source.peerreviewno
dc.source.conferenceUCPSS - Ultra Clean Processing Technology Symposium
dc.source.conferencedate16/09/2002
dc.source.conferencelocationOostende Belgium
imec.availabilityPublished - imec


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record