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Clustered single wafer wet cleaning

dc.contributor.authorMertens, Paul
dc.contributor.authorHolsteyns, Frank
dc.contributor.authorVos, Rita
dc.contributor.authorVereecke, Guy
dc.contributor.authorFyen, Wim
dc.contributor.authorLauerhaas, Jeff
dc.contributor.authorXu, Kaidong
dc.contributor.authorBearda, Twan
dc.contributor.authorTeerlinck, Ivo
dc.contributor.authorArnauts, Sophia
dc.contributor.authorKenis, Karine
dc.contributor.authorSchmidt, Michael
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-14T22:23:32Z
dc.date.available2021-10-14T22:23:32Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6599
dc.sourceIIOimport
dc.titleClustered single wafer wet cleaning
dc.typeMeeting abstract
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorArnauts, Sophia
dc.contributor.imecauthorKenis, Karine
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.source.peerreviewno
dc.source.beginpage699
dc.source.conference201st Meeting of the Electrochemical Society. Rapid Thermal and Other Short Time Processing Technologies III
dc.source.conferencedate12/05/2002
dc.source.conferencelocationPhiladelphia, PA USA
imec.availabilityPublished - imec
imec.internalnotesMeeting Abstracts; Vol. 2002-1


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