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High-NA ArF lithography for 70-nm technologies

dc.contributor.authorMontgomery, Patrick
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorLucas, Kevin
dc.date.accessioned2021-10-14T22:27:51Z
dc.date.available2021-10-14T22:27:51Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6622
dc.sourceIIOimport
dc.titleHigh-NA ArF lithography for 70-nm technologies
dc.typeProceedings paper
dc.contributor.imecauthorVandenberghe, Geert
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage1613
dc.source.endpage1624
dc.source.conferenceOptical Microlithography XV
dc.source.conferencedate5/03/2002
dc.source.conferencelocationSanta Clara, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 4691


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